Deposition of ReS2 Thin Films Using Aerosol-Assisted Chemical Vapor Deposition

Abstract

Transition metal dichalcogenides (TMDCs) have remarkable properties, which can make these materials as a source alternative to graphene. The new member of TMDCs family ReS₂ has got interest because its unique property. Synthesis ReS₂ still needs a high temperature to deposit; the high deposition temperature makes ReS₂ materials highly cost to produce. In this work the rhenium carbamate complex ([Re₂(μ-S)₂(S₂CNEt₂)₄]) which have a high thermal stability was used to synthesis ReS₂ thin films by reducing the deposition temperature to 525 °C, 25 °C less from previous study. The produced thin films were deposited using Aerosol-Assisted Chemical Vapor Deposition (AA-CVD). Films have been characterized firstly by p-XRD which confirmed that ReS₂ thin films were successfully prepared, then the morphology of thin film were investigated by SEM and the results showed morphology was smooth and uniformed.