Measurement of electron temperature (Te) and electron density (ne) of ZnO RF plasma
DOI:
https://doi.org/10.31257/2018/JKP/2022/140202Keywords:
OES , Electron temperature(Te) ,RF plasmaAbstract
In this study, the ratio method between the two spectral lines was used to calculate the electron temperature (Te) and the density (ne) of argon gas for a zinc oxide (ZnO) cathode using the spectroscopic method. These parameters were calculated at various pressure and powers parameters (0.03,0.04,0.05,and 0.06 torr) and (50,60,70 and 80 W). The results revealed that while the temperature (Te) increase of the electron with increased power and falls with increasing pressures, the density (ne) of the electrons increases with both power and pressure increases. The measured temperature of the electrons (Te) was within the range of (0.372-0.422 eV).Regarding the electron density (ne), it was in the range of (1.6×1017-7.8×1017 cm-3).
Downloads
Downloads
Published
How to Cite
Issue
Section
Categories
License
Copyright (c) 2023 Mustafa Haydar, Abdulhussain A. Khadayeir
This work is licensed under a Creative Commons Attribution 4.0 International License.
Journal of Kufa-Physics is licensed under the Creative Commons Attribution 4.0 International License, which allows users to copy, to create extracts, abstracts, and new works from the Article, to alter and revise the Article, and to make commercial use of the Article (including reuse and/or resale of the Article by commercial entities), provided the user gives appropriate credit (with a link to the formal publication through the relevant DOI), provides a link to the license, indicates if changes were made and the licensor is not represented as endorsing the use made of the work. The authors hold the copyright for their published work on the JKP website, while KJP is responsible for appreciating citation for their work, which is released under CC-BY-4.0 enabling the unrestricted use, distribution, and reproduction of an article in any medium, provided that the original work is properly cited.