Study the Structural and Optical Properties of CuO Thin films Prepared by d.c Magnetron Sputtering

Authors

  • Abdalhussain A. Khadyair
  • Ahmed H. Wanas
  • Basim A. Zije

DOI:

https://doi.org/10.31257/2018/JKP/100209

Keywords:

Thin films, Magnetron sputtering , Optical properties , magnetic field

Abstract

In this research (CuO) films were prepared  onto glass substrate of glass using plasma magnetron sputtering technique. The results of  XRD showed that the thin films  had a polycrystalline structure with monoclinic lattice unit cell. The roughness of the prepared films were  identified by atomic force microscope (AFM), where the results showed that the roughness increased from (0.386-4.22)nm with increasing the thickness from(95-316)nm. Optical properties of the prepared films of (335-1135) nm showed that the absorption of the films decreased with increasing of wavelength for all thicknesses, optical energy gap for the prepared films decreased from (3.15-2.8)eV with increasing thickness from (95-316)nm.

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Published

2018-12-10

How to Cite

A. Khadyair, A., H. Wanas, A., & A. Zije, B. (2018). Study the Structural and Optical Properties of CuO Thin films Prepared by d.c Magnetron Sputtering. Journal of Kufa-Physics, 10(2), 61–67. https://doi.org/10.31257/2018/JKP/100209

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